JavaScript seems to be disabled in your browser. For the best experience on our site, be sure to turn on Javascript in your browser.

Language

£GBP

ORDER ONLINE - quick & easy

AGENTS & DISTRIBUTORS - available worldwide

REQUEST QUOTES - fast online pricing

Home
Instrumentation
Vacuum Coaters
High Resolution Sputter Coater

High Resolution Sputter Coater

The Agar high resolution sputter coater with dry pump offers a real solution to the problems encountered when coating difficult samples for FEG SEM imaging.

All prices exclude VAT.

Description Features & specs Tech Data

Product Description

The Agar high resolution sputter coater offers a real solution to the problems encountered when coating difficult samples for FEG SEM imaging. To minimise the effect of grain size, the coater gives full control over thickness and deposition conditions. The turbomolecular drag pump provides the high vacuum necessary for sputtering non-noble metals, while having excellent gas handling characteristics. The magnetron sputtering head has the high current capability required for sputtering chromium and a source shutter for target conditioning is provided as standard.

The rotary planetary stage with tilt ensures that highly contoured samples are evenly coated. This ensures that the minimum coating thickness can be applied to give conductivity without compromising fine specimen detail. The dual height 150mm diameter work chamber gives easy adjustment of working distance.

The integrated terminating film thickness monitor allows the coating thickness to be closely controlled and reproduced for repeat samples.

Key features:

The high vacuum pump has been changed to improve the base vacuum by an order of magnitude
The dry pump provides long-term, high-vacuum performance and reliability
Sputter power supply incorporates a plasma voltage monitor to optimise the argon atmosphere for difficult material
The new AGB7234-DRY will sputter aluminium at high rates
Sputter source is a SmCo magnetron with 28mm targets for increased efficiency and target life
Front panel controls have been simplified with new software without changing functionality

Features & Specifications

Sputter head

Low voltage planar magnetron type with quick target change. Wrap-around dark-space shield

Sputter target

ø 28mm. Optional Cr, Ta, Au, Au/Pd, Pt, W, Ir, Ag can be quoted separately.

Sputter supply

Programmable digital control, microprocessor based, safety interlocked, current control independent of vacuum, 80mA max.

Sample table

Motorised Rotary Planetary stage with manual tilt (standard)

Analogue metering

Vacuum: atmosphere - 0.001mb, current: 0 - 100mA

Dimensions (W x D x H)

600mm x 600mm x 450mm

Weight

40kg

Power

550 VA max.

Pumping system speed

300 litres/min @ 0.1mb

Benchtop system

Vacuum pump is mounted on a benchtop compatible anti-vibration table with stainless steel bellows coupling system

Technical Data

AGB7234-DRY High Resolution Sputter Coater Technical Datasheet AGB7234-DRY High Resolution Sputter Coater Technical Datasheet

Specifications
Chamber size	150mm dia x 250mm high
	150mm dia x 165mm high
Sputter target	ø 28mm. Optional Cr, Ta, Au, Au/Pd, Pt, W, Ir, Ag can be quoted separately.
Sample table	Motorised Rotary Planetary stage with manual tilt (standard)
	Manual tilt 0 - 90°
	Variable speed rotation
	4 sample tables delivered standard (specify when ordering)
Sputter supply	Programmable digital control, microprocessor-based
	Safety interlocked
	Current control independent of vacuum, 80mA max
Sputter head	Low voltage planar magnetron type with quick target change
	Wrap-around dark-space shield
Analogue metering	Vacuum: atmosphere - 0.001mb
	Current: 0 - 100mA
Control method	Automatic operation of gas purge and leak functions
	Independent power/pressure adjustment allows operation at argon gas pressure ranges of 0.2 - 0.005mbar
	Automatic process sequencing
	Full manual override
	Digital timer (0-300 sec) with pause
	Automatic vent
Thickness monitoring	Film Thickness Monitor for Agar SEM Turbo Coater (AGB7240) included standard
Dimensions	Width 600mm (23.6"), Depth 600mm (23.6"), Height 450mm (17.7")
Weight	40kg
Power consumption	550VA max.
Pumping System
Configuration	Turbo-drag/rotary pump combination. Optional diaphragm pump instead of rotary pump
Pumping speed	300 litres/min @ 0.1mb
Pump downtime	1 min. to 1x10^-3mb (1.5 min. with diaphragm pump option)
Ultimate pressure	1x10^-5 mBar
Benchtop system	The vacuum pump is mounted on a benchtop compatible anti-vibration table with stainless steel bellows coupling system
Services required
Supply	100 – 120 or 200 – 240VAC, 50/60Hz (specify on order)
Power	175VA max.
Argon Gas	Purity min. 99.9%
	Pressure: regulated 7 – 8 psi (0.5 – 0.6 bar)
	Hose connection: 6.0mm (1/4”)
Thickness Monitors (optional)
General specification	Microprocessor-based
	4 digit display, push-button zero
	6MHz crystal with lifetime check
	5/sec update rate
Thickness range	0nm to 999.9nm
Resolution	Better than 0.1nm
Density range	0.50-30.00gm/cm³
Tooling factor range	0.25-8.0
Termination range	0nm to 999.9nm

Delivery & Returns

PRICE & AVAILABILITY: Please note that while we are working closely with our suppliers to minimise any global supply chain issues, prices and availability may be subject to change at short notice.