Calibration standards

A range of very high resolution reference calibration standards for AFM, SEM, Auger & FIB.

Critical dimension (CD) calibration test specimens - 10-5-2-1-0.5um structure
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This CD calibration test specimen comprises five line patterns, each one clearly identified by its pitch.
Critical dimension (CD) calibration test specimens - 500-200-100 nm structure
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This advanced CD calibration test specimen is suitable for calibrating smaller structures.
292nm reference standard
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292nm pitch reference standard for very high resolution calibration of AFM, SEM, Auger and FIB.
SEM 144nm reference standard
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These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
SEM 144nm reference standard, certified
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These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
SEM 300nm reference standard
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These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
MetroChip calibration standard
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The MetroChip microscope calibration standard provides an extensive range of features for SEM, FIB, AFM, light microscopy and metrology systems calibration.

Part no: AGS1949
Silicon nitride ion sputter standard
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100nm silicon nitride (CVD) films deposited on a piece of silicon wafer, 1 x 3cm.

Part no: AGS1805
Tantalum pentoxide ion sputter standard
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Films of tantalum pentoxide (approximately 100nm) are anodically grown on 0.5mm thick tantalum foil.

Part no: AGS1806
Nickel / chromium (Ni/Cr) ion sputter standard
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This standard consists of 12 alternating layers: six layers of chromium approximately 53nm thick, and six layers of nickel 64nm thick on a silicon wafer.

Part no: AGS1807