Silicon nitride Si
4 support membranes are suitable where carbon or plastic films are not appropriate. These silicon nitride membranes are extremely flat and smooth which significantly reduces the need for frequent re-focusing when scanning across large areas. The membranes have high stability under the electron beam and, being relatively chemically inert, are resistant to most chemicals with the exception of dilute HF, hot H2SO4 and free fluorine. The mechanical stability of the membrane allows a range of microscopy techniques, such as TEM, SEM and AFM, to be used for a variety of nanotechnology experiments. Cells, fibres and particles etc. can be mounted directly onto the support film and examined.
This MFA consists of a 17.5mm x 17.5mm outer frame containing a 5 x 5 array of TEM frames. Each of the individual frames within the sub-array contains a centred standard silicon nitride membrane.
200µm substrate thickness, multi-frame array (5 x 5 array), window size 0.50 x 0.50mm