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Silicon Nitride Membranes - 200um substrate thickness, multi-frame array (4 x 4 array)

200µm substrate thickness, multi-frame array (4 x 4 array) with 30, 50, 75, 100, 150, 200 or 500nm Silicon nitride membranes.

All prices exclude VAT.
Name & Code
Grouped product items
Code & DescriptionAvailabilityPriceQty
AGS171-1A4
30nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
AGS171-2A4
50nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
AGS171-3A4
75nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
AGS171-4A4
100nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
AGS171-5A4
150nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
AGS171-6A4
200nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
AGS171-7A4
500nm Si Nitride 4x4 Array 0.5mm x 0.5mm EA
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POA
POA
Product Description

Silicon nitride Si
3
N
4
support membranes are suitable where carbon or plastic films are not appropriate. These silicon nitride membranes are extremely flat and smooth which significantly reduces the need for frequent re-focusing when scanning across large areas. The membranes have high stability under the electron beam and, being relatively chemically inert, are resistant to most chemicals with the exception of dilute HF, hot H2SO4 and free fluorine. The mechanical stability of the membrane allows a range of microscopy techniques, such as TEM, SEM and AFM, to be used for a variety of nanotechnology experiments. Cells, fibres and particles etc. can be mounted directly onto the support film and examined.

This MFA consists of a 14.0mm x 14.0mm outer frame, containing a 4 x 4 array of TEM frames. Each of the individual frames within the sub-array contains a centred standard silicon nitride membrane.

200µm substrate thickness, multi-frame array (4 x 4 array) with window size 0.50 x 0.50mm.

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