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Holey Silicon Nitride Support Films

200nm membrane with holes from 1250nm down to 100nm.

All prices exclude VAT.
Name & Code
Grouped product items
Code & DescriptionAvailabilityPriceQty
AG21580-10
Holey Silicon Nitride Support Film, 200nm, 1250nm pores, 0.5 x 0.5mm window, 3mm dia Pk10
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POA
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AG21585-10
Holey Silicon Nitride Support Film, 200nm, 100nm pores, 0.5 x 0.5mm window, 3mm dia Pk10
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POA
POA
Product Description

Advanced MEMS technologies have been applied to incorporate many improvements into this truly unique next generation Holey Silicon Nitride Support Membrane. Holey membranes or support films are also referred to as perforated or patterned films; there is no film or membrane covering the holes. The platform for this holey silicon nitride support film is the low stress 200nm amorphous silicon nitride support film on a circular 3mm silicon frame with a 0.5 x 0.5mm membrane. There are nine hole sizes available ranging from 1250nm to 100nm. This design has a number of advantages over previously offered products:

  • Relatively large open area
  • Closely packed, higher pore density using hexagonal pore pattern
  • Added resilience of membrane
  • Practical hole size for experiments
  • TEM standard circular shape
  • EasyGrip™ edge for improved handling

Holey Silicon Nitride Support Films are resistant to solvents, acids and bases, allowing for dynamic experiments directly on the holey membrane. The Silicon Nitride Support Films allow for high temperature experiments/imaging up to 1000°C. Films can be easily cleaned using glow discharge or plasma cleaning techniques. They also provide a carbon-free background for TEM imaging and analysis. The clean manufacturing techniques avoid the debris particles that are often found on other makes of silicon nitride support films.

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