Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

This advanced CD calibration test specimen is suitable for calibrating smaller structures. It comprises three line patterns, each identified by its pitch. Each pattern has five bars and spaces of equal pitch: 500, 200 and 100 nm. The central line area can be used for AFM measurements. The patterns are etched into silicon with a depth of approximately 45 to 50 nm. There is no coating on the silicon surface.

Each standard is identified by a unique serial number.

The specimen can be supplied unmounted or mounted on any of the standard range of SEM stubs. Please specify.