Calibration standards

MetroChip calibration standard
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The MetroChip microscope calibration standard provides an extensive range of features for SEM, FIB, AFM, light microscopy and metrology systems calibration.

Part no: AGS1949
Silicon dioxide (Sio2)
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Silicon wafers (4") with thin films of silicon dioxide are available in thicknesses of 23, 50, 97 and 102.9 nm.
Silicon nitride (Si3N4) ion sputter standard
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100 nm silicon nitride (CVD) films deposited on a piece of silicon wafer, 1 x 3 cm.

Part no: AGS1805
Tantalum pentoxide (Ta2O5) ion sputter standard
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Films of tantalum pentoxide (approximately 100 nm) are anodically grown on 0.5mm thick tantalum foil.

Part no: AGS1806
Nickel / chromium (Ni/Cr) ion sputter standard
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This standard consists of 12 alternating layers: six layers of chromium approximately 53nm thick, and six layers of nickel 64nm thick on a silicon wafer.

Part no: AGS1807

FIB

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