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Agar Scientific

Microscopy and Lab
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FIB

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Items 1-12 of 42

  1. Critical dimension (CD) calibration test specimens - 10-5-2-1-0.5µm structure

    Critical dimension (CD) calibration test specimens - 10-5-2-1-0.5um structure

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    This CD calibration test specimen comprises five line patterns, each one clearly identified by its pitch.
  2. Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

    Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

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    This advanced CD calibration test specimen is suitable for calibrating smaller structures.
  3. 292 nm pitch reference standard

    292nm reference standard

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    292nm pitch reference standard for very high resolution calibration of AFM, SEM, Auger and FIB.
  4. 2-D holographic array standards

    SEM 144nm reference standard

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    These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
  5. 2d holographic array standards

    SEM 144nm reference standard, certified

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    These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
  6. 2d holographic array standards

    SEM 300nm reference standard

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    These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
  7. MetroChip calibration standard

    MetroChip calibration standard

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    The MetroChip microscope calibration standard provides an extensive range of features for SEM, FIB, AFM, light microscopy and metrology systems calibration.

    Part no: AGS1949

  8. Silicon dioxide (Sio?)

    Silicon dioxide wafers

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    Silicon wafers (4") with thin films of silicon dioxide (SiO2) are available in thicknesses of 23, 50, 97 and 102.9nm.
  9. Silicon nitride ion sputter standard

    Silicon nitride ion sputter standard

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    100nm silicon nitride (CVD) films deposited on a piece of silicon wafer, 1 x 3cm.

    Part no: AGS1805

  10. Tantalum pentoxide ion sputter standard

    Tantalum pentoxide ion sputter standard

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    Films of tantalum pentoxide (approximately 100nm) are anodically grown on 0.5mm thick tantalum foil.

    Part no: AGS1806

  11. Nickel / chromium (Ni/Cr) ion sputter standard

    Nickel / chromium (Ni/Cr) ion sputter standard

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    This standard consists of 12 alternating layers: six layers of chromium approximately 53nm thick, and six layers of nickel 64nm thick on a silicon wafer.

    Part no: AGS1807

  12. FIB prepared, ultra-thin TEM sectioning service

    FIB prepared TEM sectioning service

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    FIB prepared TEM sections (Foils/Lamella) prepared from your sample.
Set Descending Direction

Items 1-12 of 42