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Agar Scientific

Microscopy and Lab
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FIB

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Items 1-12 of 41

  1. Critical dimension (CD) calibration test specimens - 10-5-2-1-0.5µm structure

    Critical dimension (CD) calibration test specimens - 10-5-2-1-0.5um structure

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    This CD calibration test specimen comprises five line patterns, each one clearly identified by its pitch.
  2. Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

    Critical dimension (CD) calibration test specimens - 500-200-100 nm structure

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    This advanced CD calibration test specimen is suitable for calibrating smaller structures.
  3. 292 nm pitch reference standard

    292nm reference standard

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    292nm pitch reference standard for very high resolution calibration of AFM, SEM, Auger and FIB.
  4. 2-D holographic array standards

    SEM 144nm reference standard

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    These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.

  5. 2d holographic array standards

    SEM 144nm reference standard, certified

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    These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
  6. 2d holographic array standards

    SEM 300nm reference standard

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    These 2-D holographic array standards for simultaneous calibration of X and Y axes have unique characteristics that make them easy to use for AFM, STM, Auger, FIB and SEM.
  7. MetroChip calibration standard

    MetroChip calibration standard

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    The MetroChip microscope calibration standard provides an extensive range of features for SEM, FIB, AFM, light microscopy and metrology systems calibration.

    Part no: AGS1949

  8. Silicon nitride ion sputter standard

    Silicon nitride ion sputter standard

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    100nm silicon nitride (CVD) films deposited on a piece of silicon wafer, 1 x 3cm.

    Part no: AGS1805

  9. Tantalum pentoxide ion sputter standard

    Tantalum pentoxide ion sputter standard

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    Films of tantalum pentoxide (approximately 100nm) are anodically grown on 0.5mm thick tantalum foil.

    Part no: AGS1806

  10. Nickel / chromium (Ni/Cr) ion sputter standard

    Nickel / chromium (Ni/Cr) ion sputter standard

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    This standard consists of 12 alternating layers: six layers of chromium approximately 53nm thick, and six layers of nickel 64nm thick on a silicon wafer.

    Part no: AGS1807

  11. FIB prepared, ultra-thin TEM sectioning service

    FIB prepared TEM sectioning service

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    FIB prepared TEM sections (Foils/Lamella) prepared from your sample.
  12. FIB prepared Micro Cross Sectioning and Imaging Service

    FIB prepared Micro-Cross Sectioning and Imaging Service

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    FIB can precisely locate and section a feature on a sample and directly take images of it.

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Items 1-12 of 41